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Integrity Council for the Voluntary Carbon Market (ICVCM)

ACR has earned Program-Level CCP Approval and has started labelling CCP-Approved carbon credits

About ICVCM

In April 2024, the Governing Board of the Integrity Council for the Voluntary Carbon Market (ICVCM) approved ACR at the program level as “Core Carbon Principles (CCP) Eligible.”

The announcement represented the first step in the ICVCM process, meaning that ACR is able to label CCP-Approved carbon credits from CCP-Approved Categories of carbon credits, as those approvals are earned in the next step of assessment.

The following ACR methodologies have earned CCP Approval:

  • Destruction of Ozone Depleting Substances from International Sources (as of 06/06/2024)
  • Landfill Gas Destruction and Beneficial Use Projects (as of 06/06/2024)

Carbon credits issued to projects under these methodologies bear the CCP label in the ACR Registry.

The two ICVCM labels follow below:

Program Level – CCP Logo for use on CCP-Eligible Program websites and other digital and printed assets

Program Level – CCP Logo for use on CCP-Eligible Program websites and other digital and printed assets

Category Level – CCP Carbon Credit Logo for use against CCP-Approved carbon credits in CCP-Eligible Program registries Category Level – CCP Carbon Credit Logo for use against CCP-Approved carbon credits in CCP-Eligible Program registries

 

ICVCM is an independent body that recognizes integrity in the voluntary carbon market, unlocking private climate and carbon finance. ACR shares ICVCM’s theory of change: “build integrity and scale will follow.”

Due to our alignment, ACR has been engaging deeply with ICVCM, submitting an extensive application for assessment, proving evidence of being a CORSIA Eligible Emissions Unit Program, participating in working groups and serving on the ICVCM Governing Board.

ACR intends to secure CCP-Approved labels for all credits issued to our portfolio of active methodologies, which includes emission reductions and removals from industrial and nature-based solutions.